Each new generation of IC devices brings about a corresponding decrease in linewidths and minimum feature sizes. The technological trends and innovations in IC fabrication processes directly influence the market for masks and mask making equipment. This report examines and projects the technologies involved, their likely developments, why and when their introduction or demise will take place, what problems and choices are facing users, and where the opportunities and pitfalls are.
This report addresses the strategic issues impacting the mask making, inspection, and repair sectors of the semiconductor industry in the U.S. and the world. The mask market is segmented by geographic region. The mask equipment markets are analyzed and projected and market shares presented.
Table Of Contents
Mask Making, Inspection, and Repair: Market Analysis and Strategic Issues TABLE OF CONTENTS
Chapter 1 Introduction 1-1
1.1 The Need For This Report 1-1
Chapter 2 Executive Summary 2-1
2.1 Summary of Major Issues 2-1 2.2 Summary of Market Opportunities 2-3
Chapter 3 Technology Issues 3-1
3.1 Mask Making 3-1 3.1.1 Mask Blanks 3-1 3.1.2 Completed Masks 3-5 3.2 Mask Making Equipment 3-19 3.2.1 Electron Beam Systems 3-19 3.2.2 Laser Pattern Generators 3-25 3.3 Mask Inspection 3-31 3.3.1 Mask Defects 3-37 o Transmission Variations 3-37 o Transparent Defects 3-37 o Nuisance Defects 3-38 o CD Variations 3-38 o Reflectivity Variations 3-39 3.4 Mask Repair 3-41 3.4.1 Laser Repair 3-44 3.4.2 Focused Ion Beam Repair 3-45 3.4.3 Other Repair Methods 3-49