Chemical Mechanical Polishing (CMP) Equipment and Materials

Chemical Mechanical Polishing (CMP) Equipment and Materials

STUDY GOALS AND OBJECTIVES

Chemical mechanical polishing (CMP) is a process that, during the past 20 years, has achieved a high level of importance in various industrial sectors, particularly in microelectronics.

BCC published its first report on Equipment and Materials for Semiconductor Cleaning and Planarization in 2001, followed by a more detailed study related to chemical mechanical polishing in 2003. During the last 5 years, various technological advances have occurred in this field, leading to increased market demand for CMP equipment and materials.

The main goal of this report is to provide new insights into current CMP technology, outlining technological trends, and supplying an updated market analysis of equipment and materials utilized for chemical mechanical polishing.

Specifically, the major objectives of this study are to:

• Provide an updated review of the chemical mechanical polishing process and related equipment, focusing on the most advanced equipment upgrades and variants.
  
  
• Provide an overview of materials commonly used in chemical mechanical polishing and identify new materials.
  
  
• Highlight new technological developments in chemical mechanical polishing, while outlining technical issues.
  
  
• Review the fields of application for CMP and investigate emerging applications.
  
  
• Estimate current global markets for CMP equipment and materials (including CMP and post-CMP equipment, CMP slurries, CMP pads and pad conditioners) with growth forecasts through 2013 for each market segment.
  
  
• Identify important technology and market trends within each market segment.
  
  
• Supply an updated review of current producers of equipment and materials for chemical mechanical polishing.
  
  
• Identify major users of CMP equipment, slurries, pads and pad conditioners.
  
  
• Provide a description of current worldwide research activities and evaluate their impact on industry growth.
  
  
• Determine trends in U.S. patents issued during the most recent years

REASONS FOR DOING THIS STUDY

Chemical mechanical polishing (CMP) is used to create very smooth (i.e., polished) surfaces. During manufacturing of advanced devices used in microelectronics and other fields of application, chemical mechanical polishing serves the critical function of producing near perfectly flat (or planar) films and preparing the film surface for the deposition of successive layers. For this reason, the CMP process is also known as chemical mechanical planarization.

Although the origins of the CMP process can be traced back to the 1960s, it was not until the 1980s that this technology entered the main stream, when IBM introduced CMP for the planarization of inter-layer dielectrics and multilayered metal structures in semiconductor devices.

Since then the market for CMP equipment and materials has grown steadily, accompanied by a rapid increase in R&D activities aimed at developing slurry formulations and equipment designs to meet more stringent requirements associated with the increasing miniaturization of microelectronic devices.

Today, the CMP market is worth $2.8 billion and still growing at a fairly healthy pace.

The principal reason for doing this study is to present a current assessment of the CMP industry from both a technological and market point of view and to outline future trends and key developments.

There is also a need to evaluate the current status and future trends of the CMP industry from a global standpoint. With the ongoing globalization of markets and the relocation of many manufacturing facilities to lower cost countries, it is also necessary to provide a geographical mapping of points of production of CMP equipment and materials, relative to global sales and distribution. Such an evaluation will contribute to a broader understanding of growth opportunities for CMP equipment and materials, and their applications within the U.S. and abroad.

An equally important reason for performing this study is to provide an overview of global R&D activities related to the CMP industry, both within public and private organizations, and to illustrate the latest technological developments that can assist companies in finding opportunities for process and productivity improvements and, consequently, positively impact their future market growth.

INTENDED AUDIENCE

This study will be of primary interest to all companies that:

• Manufacture, sell, and distribute materials and equipment for chemical mechanical polishing.
  
  
• Fabricate semiconductors and other devices requiring planarization in their manufacturing process.
  
  
• Offer coating services to the thin film industry.
  
  
• Supply abrasive powders and nanomaterials.
  
  
• Produce cleaning solutions for the post-CMP process.
  
  
• Manufacture analytical instruments for thickness, flatness, and/or surface roughness characterization.
  
  
• Provide technical and/or marketing services for the microelectronics industry.
  
  
• Are planning to enter the semiconductor industry as manufacturers of polishing equipment or suppliers of chemicals, abrasives, and etching solutions.
  
  
• Overall, this study applies to industry segments such as microelectronics, data storage media, flat panel displays, optical coatings, and the general coating sector.

The study is mainly directed towards executives, directors, operations managers, sales and marketing managers, and strategic planners working within the above industries. Universities and research facilities may also find this study to be a good source of technical information regarding CMP technology, materials, and equipment, which can be used as a baseline for new or expanded R&D activities. 
 

CHAPTER ONE: INTRODUCTION

STUDY GOALS AND OBJECTIVES

REASONS FOR DOING THIS STUDY

INTENDED AUDIENCE

SCOPE OF REPORT

METHODOLOGY AND INFORMATION SOURCES

RELATED BCC RESEARCH STUDIES

ANALYST CREDENTIALS

BCC ONLINE SERVICES

DISCLAIMER

CHAPTER TWO: EXECUTIVE SUMMARY

EXECUTIVE SUMMARY

SUMMARY TABLE GLOBAL MARKET FOR CHEMICAL MECHANICAL POLISHING, THROUGH 2013 ($MILLIONS)

SUMMARY FIGURE GLOBAL MARKET FOR CHEMICAL MECHANICAL POLISHING, 2006-2013 ($MILLIONS)

CHAPTER THREE: OVERVIEW

INTRODUCTION

HISTORY OF CHEMICAL MECHANICAL POLISHING

HISTORY OF CHEMICAL ¡-(CONTINUED)

TABLE 1 CHEMICAL MECHANICAL POLISHING©¤TECHNOLOGICAL MILESTONES

FIGURE 1 CHEMICAL MECHANICAL POLISHING©¤WORLDWIDE PATENT APPLICATIONS AND PATENTS ISSUED SINCE 1960

FIGURE 1 (CONTINUED)

CHEMICAL-MECHANICAL POLISHING: PROCESS AND EQUIPMENT

POLISHING

Requirements of a CMP Process

TABLE 2 GENERAL REQUIREMENTS OF A CMP PROCESS

Equipment and Process

Dual Force Planarization

Multiple Polishing Systems

POST-CMP CLEANING

Cleaning Steps and Chemistries

Post-CMP Equipment Technology

Wet Process

Dry and Other Processes

CURRENT AND EMERGING APPLICATIONS OF CHEMICAL MECHANICAL POLISHING

TABLE 3 APPLICATIONS OF CHEMICAL MECHANICAL POLISHING BY INDUSTRY

ELECTRONICS

Microelectronics

Semiconductor Devices

TABLE 4 IC CONFIGURATIONS

TABLE 5 TYPICAL APPLICATIONS OF CHEMICAL MECHANICAL POLISHING IN SEMICONDUCTOR MANUFACTURING

Wafer Planarization

Deep Trench Capacitor Fabrication

Polysilicon Films

Shallow Trench Isolation

Pre-metal Dielectric Layers

Inter-layer Dielectric Films

Aluminum and Aluminum Alloys

Metal Polishing for Vias and Contacts

Damascene Process

MEMS and NEMS

Inkjet Printheads

Data Storage Media and Recording Heads

Magnetic Storage Media

Recording Heads

Advanced Displays

OPTICS

Lenses

Color Filters for Image Sensors

Sapphire Substrates

CHAPTER FOUR: GLOBAL MARKET

ANALYSIS OUTLINE

GLOBAL MARKET SUMMARY

MARKET SEGMENTATION BY PRODUCT CATEGORY

Market Segmentation by ¡-(Continued)

TABLE 6 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY PRODUCT CATEGORY, THROUGH 2013 ($MILLIONS)

FIGURE 2 CHEMICAL MECHANICAL POLISHING: GLOBAL MARKET BY PRODUCT CATEGORY, 2006-2013 ($MILLIONS)

FIGURE 3 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY PRODUCT CATEGORY, 2008 AND 2013 (%)

FIGURE 3 (CONTINUED)

MARKET SEGMENTATION BY APPLICATION

TABLE 7 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($MILLIONS)

FIGURE 4 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY APPLICATION, 2008 AND 2013 (%)

MARKET SEGMENTATION BY REGION

TABLE 8 CHEMICAL MECHANICAL POLISHING: REVENUES BY REGION, THROUGH 2013 ($MILLIONS)

FIGURE 5 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY REGION, 2008 AND 2013 (%)

CMP EQUIPMENT

BASIC EQUIPMENT DESIGN

TABLE 9 BASIC CHEMICAL MECHANICAL POLISHING PROCESS

CURRENT TECHNICAL ISSUES

Uniform Polishing Pressure

Carrier Head Position

Determination of Polishing Endpoint

Higher Production Throughput

On-line Inspection

Uniform Polishing Rate

Reduction of Polishing Defects

LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT

Electro-chemical Mechanical Polishing

Apparatuses and Methods for In-situ Endpoint Detection

Laser Interferometer Detector

Combined Eddy Current Sensing and Optical Monitoring

System for Endpoint Detection in Copper Damascene Process

Polishing Equipment with Pad Drum

Chemical Mechanical Polishing Equipment with Rotating Belt

CMP Equipment with Electromagnetic Coil

CURRENT MARKET STATUS

Current Market Summary

Revenues by Equipment Type

TABLE 10 SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2008 ($ BILLIONS)

FIGURE 6 SEMICONDUCTORS: REVENUES BY REGION, 2003-2008 ($ BILLIONS)

TABLE 11 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS)

FIGURE 7 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES, 2003-2008 ($ MILLIONS)

FIGURE 8 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2008 (%)

The Post-CMP Equipment Market

TABLE 12 POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, 2008

Revenues by Application

TABLE 13 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS)

FIGURE 9 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2008 (%)

Revenues by Region

Revenues ¡- (Continued)

TABLE 14 CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2008 ($MILLIONS)

FIGURE 10 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2008 (%)

MARKET GROWTH TRENDS

Semiconductor Industry Growth

TABLE 15 FORECAST - SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2013 ($BILLIONS)

FIGURE 11 FORECAST - SEMICONDUCTORS: MARKET GROWTH BY REGION, 2008 AND 2013 ($ BILLIONS)

Industry Growth for Other Emerging Applications

Data Storage Media

TABLE 16 FORECAST - HARD DISK DRIVES: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS)

FIGURE 12 FORECAST ¨C HARD DISK DRIVES: PRODUCTION SHARE BY TYPE, 2013 (% UNITS)

TABLE 17 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS)

FIGURE 13 FORECAST ¨C HARD DISKS: GLOBAL PRODUCTION BY TYPE, 2008 AND 2013 (MILLION UNITS)

FIGURE 14 FORECAST ¨C HARD DISKS: PRODUCTION SHARE BY TYPE, 2013 (% UNITS)

Recording Heads

Advanced Displays

TABLE 18 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($BILLIONS)

FIGURE 15 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, 2008 AND 2013 (MILLION UNITS)

FIGURE 16 FORECAST - FLAT PANEL DISPLAYS: MARKET SHARE BY TYPE, 2013 (%)

Optics

TABLE 19 FORECAST ¨C OPTICS: GLOBAL MARKET GROWTH, THROUGH 2013 ($ BILLIONS)

Technological Trends

Regional Trends

PROJECTED MARKET FOR CMP AND POST-CMP EQUIPMENT

Key Observations

TABLE 20 FACTORS AFFECTING SALES OF CMP AND POST-CMP EQUIPMENT, THROUGH 2013

Market Forecast for CMP and Post-CMP Equipment

Revenues by Application

TABLE 21 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)

FIGURE 17 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2013 (%)

Revenues by Equipment Type

TABLE 22 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

FIGURE 18 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2013 (%)

Post-CMP Equipment Revenues by Process Type

TABLE 23 FORECAST ¨C POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, THROUGH 2013 ($ MILLIONS)

FIGURE 19 FORECAST ¨CPOST-CMP EQUIPMENT: MARKET SHARE BY PROCESS TYPE, 2013 (%)

Revenues by Region

TABLE 24 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)

FIGURE 20 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2013 (%)

CMP SLURRIES

TECHNOLOGY

Abrasive Component

Fumed Metal Oxides

Precipitated Powders

Other Slurry Components

Slurry Compositions

TABLE 25 SLURRIES FOR CHEMICAL-MECHANICAL POLISHING

Oxide Slurry

TABLE 26 SAMSUNG ELECTRONICS - OXIDE CMP SLURRY COMPOSITION

Low-K Dielectric Slurry

TABLE 27 CABOT MICROELECTRONICS - LOW-K DIELECTRIC CMP SLURRY COMPOSITION

Polycrystalline Silicon Slurry

TABLE 28 CHEIL INDUSTRIES - POLYCRYSTALLINE SILICON CMP SLURRY COMPOSITION

Copper Slurry

TABLE 29 MOTOROLA - COPPER CMP SLURRY COMPOSITION

TABLE 30 CABOT MICROELECTRONICS - COPPER CMP SLURRY COMPOSITION

TABLE 31 ROHM AND HAAS - COPPER CMP SLURRY COMPOSITION

Tungsten Slurry

TABLE 32 DUPONT AIR PRODUCTS - TUNGSTEN CMP SLURRY COMPOSITION

CURRENT TECHNICAL ISSUES

Minimization of Polishing Defects

Polishing of Different Materials

Polishing Rate

Waste Disposal

LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT

CMP Slurry Containing Abrasive Particles with Photocatalytic Activity

Additive for Improved Selectivity of CMP Slurry

Slurry Containing Cerium Oxide for High-Speed Polishing

Polishing Slurry Causing Reduced Dishing

CURRENT MARKET STATUS

Current Market Summary

TABLE 33 CMP SLURRIES: GLOBAL REVENUES, THROUGH 2008 ($ MILLIONS)

FIGURE 21 CMP SLURRIES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS)

Revenues by Material Type

TABLE 34 CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, 2008 ($ MILLIONS/%)

FIGURE 22 CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2008 (%)

TABLE 35 DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%)

FIGURE 23 DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%)

TABLE 36 METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%)

FIGURE 24 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%)

Revenues by Application

TABLE 37 CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS/%)

FIGURE 25 CMP SLURRIES: MARKET SHARE BY APPLICATION, 2008 (%)

Revenues by Region

TABLE 38 CMP SLURRIES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS)

FIGURE 26 CMP SLURRIES: MARKET SHARE BY REGION, 2008 (%)

MARKET GROWTH TRENDS

Technological Trends

PROJECTED MARKET FOR CMP SLURRIES

Key Observations

TABLE 39 FACTORS AFFECTING SALES OF CMP SLURRIES, THROUGH 2013

Market Forecast for CMP Slurries

Revenues by Application

TABLE 40 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)

FIGURE 27 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY APPLICATION, 2013 (%)

FIGURE 27 (CONTINUED)

Revenues by Material Type

TABLE 41 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, THROUGH 2013 ($ MILLIONS)

FIGURE 28 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2013 (%)

TABLE 42 FORECAST - DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

FIGURE 29 FORECAST - DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%)

TABLE 43 FORECAST - METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

FIGURE 30 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%)

Revenues by Region

TABLE 44 FORECAST ¨C CMP SLURRIES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)

FIGURE 31 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY REGION, 2013 (%)

FIGURE 31 (CONTINUED)

OTHER CMP CONSUMABLES

TECHNOLOGY

Pads

Designs and Materials

Shapes

Pad Conditioners

Filters

Chemicals

CURRENT TECHNICAL ISSUES

High-polishing Rate and Uniform Planarization

Reducing Downtime for Pad Conditioning

Post-CMP Cleaning in the Copper Damascene Process

Specialized Cleaning Methods

LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT

Enhanced Pad Conditioner

Transparent Microporous CMP Pad

Elastomer-modified CMP Pad

Post-CMP Cleaning Solution for Thin Film Magnetic Heads Wafer Fabrication

CURRENT MARKET STATUS

Current Market Summary

Revenues by Product Type

TABLE 45 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS)

FIGURE 32 OTHER CMP CONSUMABLES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS)

FIGURE 33 OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2008 (%)

Revenues by Application

TABLE 46 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS)

FIGURE 34 OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2008 (%)

Revenues by Region

TABLE 47 OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS)

FIGURE 35 OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2008 (%)

MARKET GROWTH TRENDS

Technological Trends

PROJECTED MARKET FOR CMP PADS AND OTHER CONSUMABLES

Key Observations

TABLE 48 FACTORS AFFECTING SALES OF CMP PADS AND OTHER CONSUMABLE, THROUGH 2013

Market Forecast for CMP Pads and Other Consumables

Revenues by Product Type

TABLE 49 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

FIGURE 36 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2013 (%)

Revenues by Application

TABLE 50 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)

FIGURE 37 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2013 (%)

Revenues by Region

TABLE 51 FORECAST ¨C OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)

FIGURE 38 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2013 (%)

FIGURE 38 (CONTINUED)

CHAPTER FIVE: GLOBAL INDUSTRY STRUCTURE

GLOBAL INDUSTRY STRUCTURE

SUPPLIERS OF CMP EQUIPMENT AND MATERIALS

TABLE 52 MANUFACTURERS OF CMP EQUIPMENT, SLURRIES, AND CONSUMABLES

TABLE 52 (CONTINUED)

TABLE 52 (CONTINUED)

TABLE 53 MANUFACTURERS OF CMP EQUIPMENT AND MATERIALS, BY PRODUCT CATEGORY

TABLE 53 (CONTINUED)

TABLE 53 (CONTINUED)

FIGURE 39 MANUFACTURERS OF CMP EQUIPMENT AND MATERIALS: DISTRIBUTION BY SIZE, 2007 (NUMBER OF COMPANIES)

FIGURE 40 HISTORICAL GROWTH OF PRODUCERS OF CMP EQUIPMENT AND MATERIALS, 1995-2000+ (NUMBER OF COMPANIES)

TABLE 54 NOTABLE INDUSTRY CHANGES SINCE 2000

CMP EQUIPMENT AND MATERIALS: PRODUCTION BY REGION

TABLE 55 CMP EQUIPMENT AND MATERIALS: MANUFACTURING BY REGION, 2006-2013 (PERCENT OF SALES)

CMP EQUIPMENT AND MATERIALS: CONSUMPTION BY REGION

TABLE 56 CMP EQUIPMENT AND MATERIALS: CONSUMPTION BY REGION, 2006-2013 (PERCENT OF SALES)

COMPANY PROFILES

3M

APPLIED MATERIALS

Applied Materials (Continued)

CABOT MICROELECTRONICS

TABLE 57 CABOT MICROELECTRONICS - CMP SLURRIES

TABLE 57 (CONTINUED)

DUPONT AIR PRODUCTS NANOMATERIALS

TABLE 58 DA NANOMATERIALS - CMP SLURRIES

EBARA CORP.

FERRO CORPORATION

Ferro Corporation (Continued)

FUJIMI

Fujimi (Continued)

HITACHI CHEMICAL

JSR CORPORATION

LAM RESEARCH

NIHON MICRO COATING

NOVELLUS SYSTEMS

Novellus Systems (Continued)

PRAXAIR

ROHM AND HAAS

TABLE 59 ROHM AND HAAS - CMP SLURRIES AND CLEANING SOLUTIONS

Rohm and Haas (Continued)

TOKYO ELECTRON

TOP PLAYERS MARKET SHARE

CMP AND POST-CMP EQUIPMENT

TABLE 60 CMP AND POST-CMP EQUIPMENT: MARKET SHARE OF TOP 5 MANUFACTURERS, 2007 AND 2008

FIGURE 41 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY COMPANY, 2007 (%)

CMP SLURRIES

TABLE 61 CMP SLURRIES: MARKET SHARE OF TOP 5 MANUFACTURERS, 2007 AND 2008

FIGURE 42 CMP SLURRIES: MARKET SHARE BY COMPANY, 2007 (%)

PADS AND OTHER CMP CONSUMABLES

TABLE 62 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE OF TOP 5 MANUFACTURERS, 2007 AND 2008

FIGURE 43 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE BY COMPANY, 2007 (%)

CHAPTER SIX: INDUSTRY COMPETITIVENESS

CHEMICAL MECHANICAL POLISHING DEVELOPMENT ACTIVITIES

TABLE 63 RESEARCH ORGANIZATIONS INVOLVED IN CHEMICAL MECHANICAL POLISHING, WORLDWIDE

TABLE 63 (CONTINUED)

TABLE 63 (CONTINUED)

TABLE 63 (CONTINUED)

TABLE 63 (CONTINUED)

TABLE 63 (CONTINUED)

UNITED STATES

Clarkson University

TABLE 64 CLARKSON UNIVERSITY RESEARCH

Massachusetts Institute of Technology

TABLE 65 MIT RESEARCH

National Institute of Standards and Technologies

TABLE 66 NIST RESEARCH

Rensselaer Polytechnic Institute

TABLE 67 RENSSELAER POLYTECHNIC INSTITUTE RESEARCH

University of Florida at Gainesville

TABLE 68 UNIVERSITY OF FLORIDA RESEARCH

EUROPE

Interuniversitair Microelektronica Centrum, Belgium

TABLE 69 IMEC CMP RESEARCH

University of Twente, The Netherlands

TABLE 70 UNIVERSITY OF TWENTE RESEARCH

ASIA PACIFIC

Hanyang University, South Korea

TABLE 71 HANYANG UNIVERSITY RESEARCH

Kyushu University, Japan

TABLE 72 KYUSHU UNIVERSITY RESEARCH

Nanyang Technological University, Singapore

TABLE 73 NTU RESEARCH

SUMMARY OF GLOBAL R&D ACTIVITIES IN CMP TECHNOLOGY

FIGURE 44 CURRENT GLOBAL RESEARCH AND DEVELOPMENT BY SUBJECT (%)

FIGURE 44 (CONTINUED)

Industry Initiatives

TABLE 74 PRIVATE ORGANIZATIONS INVOLVED IN CMP RESEARCH

TABLE 74 (CONTINUED)

OTHER CONSIDERATIONS

COST FACTOR

Equipment Cost

Materials Cost

QUALITY FACTOR

TECHNOLOGY FACTOR

MANUFACTURING CAPABILITY

KEY GROWTH MARKETS

TABLE 75 GLOBAL GROWTH FORECAST FOR CURRENT AND POTENTIAL CMP APPLICATIONS, 2008-2013

MARKET GROWTH FACTORS

DRIVING FORCES

IMPACT OF MARKET GROWTH FACTORS

TABLE 76 PERCENTAGE IMPACT OF MAJOR COMPETITIVE FACTORS ON THE GROWTH OF THE CMP MARKET, 2008-2013

CHAPTER SEVEN: U.S. PATENT ANALYSIS

INTRODUCTION

SUMMARY OF PATENTS AWARDED DURING THE PERIOD 2006 THROUGH 2008

TABLE 77 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS, 2008

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 77 (CONTINUED)

TABLE 78 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS, 2007

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 78 (CONTINUED)

TABLE 79 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS, 2006

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

TABLE 79 (CONTINUED)

GENERAL TRENDS

TABLE 80 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT TRENDS, 2006-2008

FIGURE 45 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT TRENDS, 2006-2008 (NUMBER OF PATENTS)

TRENDS BY COUNTRY AND REGION

FIGURE 46 SHARES OF GLOBAL PATENTS RELATED TO CHEMICAL MECHANICAL POLISHING BY REGION, 2006-2008 (%) .... 233

FIGURE 47 CHEMICAL MECHANICAL POLISHING: PATENTS BY COUNTRY, 2006-2008 (%)

FIGURE 47 (CONTINUED)

TRENDS BY ASSIGNEE

TABLE 81 ASSIGNEES OF U.S. PATENTS RELATED TO CHEMICAL MECHANICAL POLISHING, 2006-2008

TABLE 81 (CONTINUED)

TABLE 81 (CONTINUED)

TABLE 81 (CONTINUED)

TABLE 81 (CONTINUED)

TRENDS BY PATENT CATEGORY

FIGURE 48 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY CATEGORY, 2006-2008 (%)

TRENDS BY APPLICATION

FIGURE 49 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY APPLICATION, 2006-2008 (%)

TRENDS BY MATERIAL TYPE

FIGURE 50 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY MATERIAL TYPE, 2006- 2008 (%)

FIGURE 50 (CONTINUED)

LIST OF TABLES

SUMMARY TABLE GLOBAL MARKET FOR CHEMICAL MECHANICAL

POLISHING, THROUGH 2013 ($MILLIONS)

TABLE 1 CHEMICAL MECHANICAL POLISHING©¤TECHNOLOGICAL

MILESTONES

TABLE 2 GENERAL REQUIREMENTS OF A CMP PROCESS

TABLE 3 APPLICATIONS OF CHEMICAL MECHANICAL POLISHING

BY INDUSTRY

TABLE 4 IC CONFIGURATIONS

TABLE 5 TYPICAL APPLICATIONS OF CHEMICAL MECHANICAL

POLISHING IN SEMICONDUCTOR MANUFACTURING

TABLE 6 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES

BY PRODUCT CATEGORY, THROUGH 2013 ($MILLIONS)

TABLE 7 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES

BY APPLICATION, THROUGH 2013 ($MILLIONS)

TABLE 8 CHEMICAL MECHANICAL POLISHING: REVENUES BY

REGION, THROUGH 2013 ($MILLIONS)

TABLE 9 BASIC CHEMICAL MECHANICAL POLISHING PROCESS

TABLE 10 SEMICONDUCTORS: REVENUES BY REGION, THROUGH

2008 ($ BILLIONS)

TABLE 11 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY

TYPE, THROUGH 2008 ($ MILLIONS)

TABLE 12 POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS

TYPE, 2008

TABLE 13 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY

APPLICATION, 2008 ($ MILLIONS)

TABLE 14 CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION,

THROUGH 2008 ($MILLIONS)

TABLE 15 FORECAST - SEMICONDUCTORS: REVENUES BY REGION,

THROUGH 2013 ($BILLIONS)

TABLE 16 FORECAST - HARD DISK DRIVES: GLOBAL PRODUCTION

BY TYPE, THROUGH 2013 (MILLION UNITS)

TABLE 17 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE,

THROUGH 2013 (MILLION UNITS)

TABLE 18 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES

BY TYPE, THROUGH 2013 ($BILLIONS)

TABLE 19 FORECAST ¨C OPTICS: GLOBAL MARKET GROWTH,

THROUGH 2013 ($ BILLIONS)

TABLE 20 FACTORS AFFECTING SALES OF CMP AND POST-CMP

EQUIPMENT, THROUGH 2013

TABLE 21 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL

REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)

TABLE 22 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL

REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

TABLE 23 FORECAST ¨C POST-CMP EQUIPMENT: GLOBAL REVENUES

BY PROCESS TYPE, THROUGH 2013 ($ MILLIONS)

TABLE 24 FORECAST ¨C CMP AND POST-CMP EQUIPMENT:

REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)

TABLE 25 SLURRIES FOR CHEMICAL-MECHANICAL POLISHING

TABLE 26 SAMSUNG ELECTRONICS - OXIDE CMP SLURRY

COMPOSITION

TABLE 27 CABOT MICROELECTRONICS - LOW-K DIELECTRIC CMP

SLURRY COMPOSITION

TABLE 28 CHEIL INDUSTRIES - POLYCRYSTALLINE SILICON CMP

SLURRY COMPOSITION

TABLE 29 MOTOROLA - COPPER CMP SLURRY COMPOSITION

TABLE 30 CABOT MICROELECTRONICS - COPPER CMP SLURRY

COMPOSITION

TABLE 31 ROHM AND HAAS - COPPER CMP SLURRY COMPOSITION

TABLE 32 DUPONT AIR PRODUCTS - TUNGSTEN CMP SLURRY

COMPOSITION

TABLE 33 CMP SLURRIES: GLOBAL REVENUES, THROUGH 2008 ($

MILLIONS)

TABLE 34 CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE,

2008 ($ MILLIONS/%)

TABLE 35 DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY

TYPE, 2008 ($ MILLIONS/%)

TABLE 36 METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008

($ MILLIONS/%)

TABLE 37 CMP SLURRIES: GLOBAL REVENUES BY APPLICATION,

2008 ($ MILLIONS/%)

TABLE 38 CMP SLURRIES: REVENUES BY REGION, THROUGH 2008

($MILLIONS)

TABLE 39 FACTORS AFFECTING SALES OF CMP SLURRIES,

THROUGH 2013

TABLE 40 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY

APPLICATION, THROUGH 2013 ($ MILLION)

TABLE 41 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY

MATERIAL TYPE, THROUGH 2013 ($ MILLIONS)

TABLE 42 FORECAST - DIELECTRIC CMP SLURRIES: GLOBAL

REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

TABLE 43 FORECAST - METAL CMP SLURRIES: GLOBAL REVENUES

BY TYPE, THROUGH 2013 ($ MILLIONS)

TABLE 44 FORECAST ¨C CMP SLURRIES: REVENUES BY REGION,

THROUGH 2013 ($ MILLIONS)

TABLE 45 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY

TYPE, THROUGH 2008 ($ MILLIONS)

TABLE 46 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY

APPLICATION, 2008 ($ MILLIONS)

TABLE 47 OTHER CMP CONSUMABLES: REVENUES BY REGION,

THROUGH 2008 ($MILLIONS)

TABLE 48 FACTORS AFFECTING SALES OF CMP PADS AND OTHER

CONSUMABLE, THROUGH 2013

TABLE 49 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL

REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)

TABLE 50 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL

REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)

TABLE 51 FORECAST ¨C OTHER CMP CONSUMABLES: REVENUES BY

REGION, THROUGH 2013 ($ MILLIONS)

TABLE 52 MANUFACTURERS OF CMP EQUIPMENT, SLURRIES, AND

CONSUMABLES

TABLE 53 MANUFACTURERS OF CMP EQUIPMENT AND MATERIALS,

BY PRODUCT CATEGORY

TABLE 54 NOTABLE INDUSTRY CHANGES SINCE 2000

TABLE 55 CMP EQUIPMENT AND MATERIALS: MANUFACTURING BY

REGION, 2006-2013 (PERCENT OF SALES)

TABLE 56 CMP EQUIPMENT AND MATERIALS: CONSUMPTION BY

REGION, 2006-2013 (PERCENT OF SALES)

TABLE 57 CABOT MICROELECTRONICS - CMP SLURRIES

TABLE 58 DA NANOMATERIALS - CMP SLURRIES

TABLE 59 ROHM AND HAAS - CMP SLURRIES AND CLEANING

SOLUTIONS

TABLE 60 CMP AND POST-CMP EQUIPMENT: MARKET SHARE OF

TOP 5 MANUFACTURERS, 2007 AND 2008

TABLE 61 CMP SLURRIES: MARKET SHARE OF TOP 5

MANUFACTURERS, 2007 AND 2008

TABLE 62 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE

OF TOP 5 MANUFACTURERS, 2007 AND 2008

TABLE 63 RESEARCH ORGANIZATIONS INVOLVED IN CHEMICAL

MECHANICAL POLISHING, WORLDWIDE

TABLE 64 CLARKSON UNIVERSITY RESEARCH

TABLE 65 MIT RESEARCH

TABLE 66 NIST RESEARCH

TABLE 67 RENSSELAER POLYTECHNIC INSTITUTE RESEARCH

TABLE 68 UNIVERSITY OF FLORIDA RESEARCH

TABLE 69 IMEC CMP RESEARCH

TABLE 70 UNIVERSITY OF TWENTE RESEARCH

TABLE 71 HANYANG UNIVERSITY RESEARCH

TABLE 72 KYUSHU UNIVERSITY RESEARCH

TABLE 73 NTU RESEARCH

TABLE 74 PRIVATE ORGANIZATIONS INVOLVED IN CMP RESEARCH

TABLE 75 GLOBAL GROWTH FORECAST FOR CURRENT AND

POTENTIAL CMP APPLICATIONS, 2008-2013

TABLE 76 PERCENTAGE IMPACT OF MAJOR COMPETITIVE FACTORS

ON THE GROWTH OF THE CMP MARKET, 2008-2013

TABLE 77 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS,

2008

TABLE 78 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS,

2007

TABLE 79 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS,

2006

TABLE 80 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT

TRENDS, 2006-2008

TABLE 81 ASSIGNEES OF U.S. PATENTS RELATED TO CHEMICAL

MECHANICAL POLISHING, 2006-2008

LIST OF FIGURES

SUMMARY FIGURE GLOBAL MARKET FOR CHEMICAL MECHANICAL

POLISHING, 2006-2013 ($MILLIONS)

FIGURE 1 CHEMICAL MECHANICAL POLISHING©¤WORLDWIDE

PATENT APPLICATIONS AND PATENTS ISSUED SINCE 1960

FIGURE 2 CHEMICAL MECHANICAL POLISHING: GLOBAL MARKET

BY PRODUCT CATEGORY, 2006-2013 ($MILLIONS)

FIGURE 3 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY

PRODUCT CATEGORY, 2008 AND 2013 (%)

FIGURE 4 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY

APPLICATION, 2008 AND 2013 (%)

FIGURE 5 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY

REGION, 2008 AND 2013 (%)

FIGURE 6 SEMICONDUCTORS: REVENUES BY REGION, 2003-2008 ($

BILLIONS)

FIGURE 7 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES,

2003-2008 ($ MILLIONS)

FIGURE 8 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY

TYPE, 2008 (%)

FIGURE 9 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY

APPLICATION, 2008 (%)

FIGURE 10 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY

REGION, 2008 (%)

FIGURE 11 FORECAST - SEMICONDUCTORS: MARKET GROWTH BY

REGION, 2008 AND 2013 ($ BILLIONS)

FIGURE 12 FORECAST ¨C HARD DISK DRIVES: PRODUCTION SHARE

BY TYPE, 2013 (% UNITS)

FIGURE 13 FORECAST ¨C HARD DISKS: GLOBAL PRODUCTION BY

TYPE, 2008 AND 2013 (MILLION UNITS)

FIGURE 14 FORECAST ¨C HARD DISKS: PRODUCTION SHARE BY TYPE,

2013 (% UNITS)

FIGURE 15 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES

BY TYPE, 2008 AND 2013 (MILLION UNITS)

FIGURE 16 FORECAST - FLAT PANEL DISPLAYS: MARKET SHARE BY

TYPE, 2013 (%)

FIGURE 17 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET

SHARE BY APPLICATION, 2013 (%)

FIGURE 18 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET

SHARE BY TYPE, 2013 (%)

FIGURE 19 FORECAST ¨CPOST-CMP EQUIPMENT: MARKET SHARE BY

PROCESS TYPE, 2013 (%)

FIGURE 20 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET

SHARE BY REGION, 2013 (%)

FIGURE 21 CMP SLURRIES: GLOBAL REVENUES, 2003-2008 ($

MILLIONS)

FIGURE 22 CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE,

2008 (%)

FIGURE 23 DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE,

2008 (%)

FIGURE 24 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2008

(%)

FIGURE 25 CMP SLURRIES: MARKET SHARE BY APPLICATION, 2008

(%)

FIGURE 26 CMP SLURRIES: MARKET SHARE BY REGION, 2008 (%)

FIGURE 27 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY

APPLICATION, 2013 (%)

FIGURE 28 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY

MATERIAL TYPE, 2013 (%)

FIGURE 29 FORECAST - DIELECTRIC CMP SLURRIES: MARKET

SHARE BY TYPE, 2013 (%)

FIGURE 30 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2013

(%)

FIGURE 31 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY

REGION, 2013 (%)

FIGURE 32 OTHER CMP CONSUMABLES: GLOBAL REVENUES, 2003-

2008 ($ MILLIONS)

FIGURE 33 OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE,

2008 (%)

FIGURE 34 OTHER CMP CONSUMABLES: MARKET SHARE BY

APPLICATION, 2008 (%)

FIGURE 35 OTHER CMP CONSUMABLES: MARKET SHARE BY

REGION, 2008 (%)

FIGURE 36 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET

SHARE BY TYPE, 2013 (%)

FIGURE 37 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET

SHARE BY APPLICATION, 2013 (%)

FIGURE 38 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET

SHARE BY REGION, 2013 (%)

FIGURE 39 MANUFACTURERS OF CMP EQUIPMENT AND

MATERIALS: DISTRIBUTION BY SIZE, 2007 (NUMBER OF

COMPANIES)

FIGURE 40 HISTORICAL GROWTH OF PRODUCERS OF CMP

EQUIPMENT AND MATERIALS, 1995-2000+ (NUMBER OF

COMPANIES)

FIGURE 41 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY

COMPANY, 2007 (%)

FIGURE 42 CMP SLURRIES: MARKET SHARE BY COMPANY, 2007 (%)

FIGURE 43 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE

BY COMPANY, 2007 (%)

FIGURE 44 CURRENT GLOBAL RESEARCH AND DEVELOPMENT BY

SUBJECT (%)

FIGURE 45 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT

TRENDS, 2006-2008 (NUMBER OF PATENTS)

FIGURE 46 SHARES OF GLOBAL PATENTS RELATED TO CHEMICAL

MECHANICAL POLISHING BY REGION, 2006-2008 (%)

FIGURE 47 CHEMICAL MECHANICAL POLISHING: PATENTS BY

COUNTRY, 2006-2008 (%)

FIGURE 48 CHEMICAL MECHANICAL POLISHING: SHARES OF

GLOBAL PATENTS BY CATEGORY, 2006-2008 (%)

FIGURE 49 CHEMICAL MECHANICAL POLISHING: SHARES OF

GLOBAL PATENTS BY APPLICATION, 2006-2008 (%)

FIGURE 50 CHEMICAL MECHANICAL POLISHING: SHARES OF

GLOBAL PATENTS BY MATERIAL TYPE, 2006- 2008 (%)