World Thin Layer Deposition Equipment Market

World Thin Layer Deposition Equipment  Market
  • Report price : $ 3 950
  • Publication date : October 2008
  • Length : 381 pages

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World Thin Layer Deposition Equipment Market

This report analyzes the worldwide markets for Thin Layer Deposition Equipment in Millions of US$. The major product segments analyzed are 1.Physical Vapor Deposition (PVD) Equipment (Microelectronics, Cutting Tools, Industrial, Specialty Packaging, Storage, Optics, and Medical), and 2.Chemical Vapor Deposition (CVD) Equipment (Microelectronics, Cutting Tools, Industrial, and Medical). The End-use segments discussed include Microelectronics, Cutting Tools, Industrial Applications, Specialty Packaging, Data Storage, Optoelectronic Components, and Medical Technology Applications. The report provides separate comprehensive analytics for the US, Canada, Japan, Europe, Asia-Pacific, and Rest of World. Annual forecasts are provided for each region for the period of 2001 through 2015. A ten-year historic analysis is also provided for these markets with annual market analytics. The report profiles 119 companies including players such as AIXTRON, Applied Materials, Inc., ASM International N.V., Axcelis Technologies, Inc., Canon ANELVA Corporation, CHA Industries, CVD Equipment Corporation, Denton Vacuum, Edwards Limited, Ibis Technology Corporation, Implant Sciences Corporation, Ionbond AG, Jusung Engineering Co., Ltd., KDF Electronic & Vacuum Services, Inc., Kokusai Semiconductor Equipment Corporation, Kookje Electric Korea Co., Ltd., Novellus Systems, Inc., OC Oerlikon Corporation AG, RIBER SA, Seki Technotron USA, SEN Corporation, Silicon Genesis Corporation, Tecvac Limited, Tegal Corporation, Ti-Coating, Inc., Tokyo Electron Limited, Ultramet, ULVAC Technologies, Inc., Vapor Technologies, Inc., and Veeco Instruments. Market data and analytics are derived from primary and secondary research. Company profiles are mostly extracted from URL research and reported select online sources.

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