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Thin-layer Deposition: CVD, Ion Implantation and Epitaxy

Thin-layer Deposition: CVD, Ion Implantation and Epitaxy

  • May 2014
  • 121 pages
  • ID: 2118438

Summary

Table of Contents

The global chemical vapor deposition (CVD) market is expected to increase from $5 billion in 2014 to nearly $6.8 billion by the end of 2019, a compound annual growth rate (CAGR) of 6.3% for the five-year period, 2014 to 2019.

This report provides:

An overview of the global markets for thin-layer deposition technologies, including chemical vapor deposition (CVD), ion implementation and epitaxy.
Analyses of global market trends, with data from 2013, estimates for 2014, and projections of CAGRs through 2019.
Discussion of the advantages and limitations of each technology.
Domestic and international technological issues.
Analysis of the industry's manufacturing capacity and consumption by various regional markets.

STUDY GOALS AND OBJECTIVES

In recent years, the semiconductor industry has experienced a relatively positive and steady growth, primarily fueled by the demand for semiconductors, electronic components and devices for everyday items such as smartphones, tablets and laptops. The numerous processes involved in the manufacturing of semiconductors are crucial to their ability to perform per user specifications. Thin-layer deposition is an important process in the manufacturing of semiconductors and electronic components.
Thin-layer deposition entails depositing a thin layer of a particular material onto a substance or substrate. The thickness of this layer varies in terms of nanometers.
BCC Research’s goal in conducting this study was to determine the current status of the global market for thin-layer deposition by looking at three important technologies: chemical vapor deposition (CVD), ion implantation and molecular beam epitaxy (MBE). Each technology has its own unique advantages and suits specific requirements for the designated type of deposition. This report provides an in-depth analysis of these three technologies for the period from 2013 to 2019.
The primary objective of this study is to present a comprehensive analysis of these key technologies in thin-layer deposition and to provide insight into future market trends.

REASONS FOR DOING THE STUDY

The requirement for thin-layer deposition has changed considerably over the years. This is due to the fact that the numerous electronic devices currently being manufactured are considerably smaller and compact in comparison to their predecessors. Such changes require the technology and the equipment used for thin-layer deposition to be in tune with end-user requirements. In this aspect, BCC Research conducted an extensive study into some of the most common thin-layer deposition technologies and provided a detailed analysis of their various advantages and uses. The research includes the services function of each technology. BCC Research believes that the changing dynamics in thin-layer deposition is of key interest to various industry participants.

INTENDED AUDIENCE

BCC Research assembled a study of these three types of thin-layer equipment, the materials used and the value of services provided by four key industry groups. An overview of thin-layer deposition and implantation technology and future trends, along with a global industry structure, including leading manufacturers and service providers, is reviewed and provided in the study. A review of the industry’s competition is presented in each section, as well as an overview of the major applications, advantages and analysis of market dynamics that will impact demand. The study is intended for:
Manufacturers and suppliers of the three types of equipment discussed in this study.
Companies involved in the design, development and manufacture of semiconductors and other microelectronic products.
Manufacturers and suppliers of electronic materials and compound semiconductor wafers.
Manufacturers of medical devices and equipment.
Manufacturers and users of cutting tools.
Manufacturers of automotive and aerospace parts and related equipment.
Manufacturers and suppliers of industrial tools.
Companies involved in manufacturing and supplying advanced materials.

SCOPE OF REPORT/b>

The scope of the study is limited to the three main technologies as named in the thin-layer deposition market. The materials used in these technologies are also studied and discussed in terms of their applications and unique properties. BCC Research analyzes the major types of CVD, ion implantation and epitaxy systems used to manufacture products in four key industries. Trends in demand and their impact on each thin-film technology, as well as key market drivers within each industry, are assessed and reviewed.

METHODOLOGY

BCC Research collected the data for this report through primary and secondary sources. The report presents an analysis of the value of the three thin-layer technologies by material and industry segment. BCC Research also conducted several surveys based on which industry growth in relation to the growth of each thin-layer technology is analyzed. Growth rates and forecast shipments are estimated to 2019.

INFORMATION SOURCES

BCC Research interviewed more than 100 companies to obtain the data for this report. The interviewed participants included manufacturers of CVD, ion implantation and MBE equipment, as well as material suppliers, deposition service providers, industrial and consumer product manufacturing companies and various end users of products manufactured using these processes. Additional data was obtained from trade associations, industry participants and financial sources.

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